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In page Chemical vapor deposition:
"CVD for molybdenum, tantalum, titanium, nickel is widely used.[citation needed] These metals can form useful silicides when deposited onto silicon. Mo, Ta, and Ti are deposited by LPCVD, from their pentachlorides. However, nickel, molybdenum, and tungsten can be deposited at low temperatures from their carbonyl precursors. In general, for an arbitrary metal M, the chloride deposition reaction is as follows:
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